An Introduction to Process Instrumentation and Control

Originally delivered Oct 4, 2017
Source: AIChE
  • Type:
    Archived Webinar
  • Level:
    Basic
  • Duration:
    1 hour
  • PDHs:
    1.00

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Don’t let lack of education or experience in process instrumentation/control hold you back. Take this quick introductory webinar.

In 60 minutes, you’ll gain an easy-to-understand introduction to the key elements and functionality of process control systems and instrumentation. You’ll examine control systems objectives and architecture and associated process instrumentation, sequence/logic control, and single-loop control and enhancements. This webinar will also cover the tuning and troubleshooting of control systems. While this is an introductory-level webinar, you’ll also gain an overview of advanced control systems. Then, you’ll preview AIChE Academy curriculum that will lead you to a more in-depth study of process instrumentation and control.

Take a look at your agenda:

  • The basic elements and architecture of control systems  
  • Tuning and troubleshooting control systems
  • Fundamentals of single-loop control
  • Advanced control systems – an overview
Presenter(s): 

David Clough

David Clough recently retired after a 43-year career on the chemical engineering faculty at the University of Colorado in Boulder. His prior industrial experience with DuPont, his academic research and consulting activities have been in the fields of instrumentation, process control, computing and applied statistics. Dr. Clough has taught short courses for the AIChE since 1989, including over 120 in-person offerings of Spreadsheet Problem-Solving for Chemical Engineers, and he currently has two on-line courses in the AIChE Academy.Read more

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AIChE Member Credits 1
AIChE Members $69.00
AIChE Undergraduate Student Members Free
AIChE Graduate Student Members Free
Non-Members $99.00
Webinar content is available with the kind permission of the author(s) solely for the purpose of furthering AIChE’s mission to educate, inform and improve the practice of professional chemical engineering. All other uses are forbidden without the express consent of the author(s).
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