In 2025, the American Institute of Chemical Engineers’ (AIChE) Board of Directors announced the creation of a new Institute-level high honor. The L.-S. Fan Award for Advancing Fundamentals of Chemical Engineering will recognize an individual's significant and new contributions to the advancement of fundamental practice areas in chemical engineering, such as particle technology. The prize is named in honor of particle technology pioneer Liang-Shih (L.-S.) Fan, Professor at The Ohio State University, and will be supported by an endowment with fundraising led by Ah-Hyung (Alissa) Park (University of California, Los Angeles) and Bing Du (ExxonMobil), in collaboration with the AIChE Foundation.
Criteria:
1. The recipient should have a record of sustained contributions that have advanced the frontiers of chemical engineering, with an emphasis on particle science and technology or related fields. These contributions can be applied to many other forums an practice areas withn AIChE, academia, or indutry. Such contributions may be characterized by a sustained record of important fundamental research, innovation, technological development, or the novel application of technology, either fostering or leading to importat commercial results.
2. The recipient does not have to me a member of AIChE.
| Details | |
|---|---|
| Award | The award consists of a plaque and $3,000. The honoree will be invited to present a lecture at the subsequent year's AIChE Annual Meeting. |
| Deadline | July 15, 2025 |
| Administrators | AIChE |
| Presentation | The award will be presented during the Honors Ceremony at each year's AIChE Annual Meeting. |
| Nomination Instructions | Nominations: General award provisions, a description of the nomination packet, and a link to the nomination platform can be found at https://www.aiche.org/community/awards/awards-provisions-eligibility. |
| Sponsors | Air Products and Chemicals, Inc. |