Dual Plasma Burner and Controller | AIChE

Dual Plasma Burner and Controller

Using patented Sievers Dual Plasma Technology, which harnesses the power of two-flame plasma combustion, the Dual Plasma Burner and Controller substantially enhance detector analytical performance, cut start-up and equilibration times, reduce maintenance, and enable new detection capabilities. The compact Sievers Dual Plasma Burner advances the established Sievers chemiluminescence technology with a 200% or larger increase in selectivity and stability for both the 355 SCD and 255 NCD, and a 40% improvement in sensitivity for the NCD. Other enhancements include a burner safety shroud, a heated base for exceptional baseline stability, and longer-lived ceramic tubes. The Dual Plasma Burner comes with a drop-in burner mount for easy installation on all major gas chromatograph (GC) brands and incorporates features for easy maintenance. The new Sievers Dual Plasma Controller features in-line electronic flow sensors, a convenient digital display with added controls and functionality, a narrower footprint, and an embedded nitrosamine option control for the 255 NCD.

Company 

Ionics Instruments

Teaser 

Dual Plasma Burner and Controller Enhance Analytical Performance

Source 

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