Materials Interfaces - Celebrating the Career of John Ekerdt | AIChE

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Materials Interfaces - Celebrating the Career of John Ekerdt

Chair(s)

Chang, J., UCLA

Co-chair(s)

Hwang, G., The University of Texas at Austin

This session is an invited session, celebrating the brilliant career of John Ekerdt, as he retires from UT Austin.

Presentations

12:30 PM
(24a) Chemical Processing of Function Accelerated Nano-Materials at the Atomic Scale
12:48 PM
(24b) Surface Reaction Kinetics during Area-Selective Thin Film Deposition
1:06 PM
(24c) Controlling Nucleation and Selectivity in Atomic Layer Deposition for Materials Synthesis
1:24 PM
(24d) High Quality Tunable Plasmonic Nanostructures By Atomic Layer Deposition
1:42 PM
(24e) Chemical “Engineerifying” Electronics
2:00 PM
(24f) The Elusive Surface M2O7 Dimer Active Site
2:18 PM
(24g) The Dual Nature of Chemical Reaction Engineering
2:36 PM
(24h) Plasma Enhanced Atomic Layer Deposition of Silicon Carbonitride

Topics 

Materials
Interfacial Phenomena

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Pricing

Individuals

AIChE Pro Members $150.00
AIChE Emeritus Members $105.00
AIChE Graduate Student Members Free
AIChE Undergraduate Student Members Free
AIChE Explorer Members $225.00
Non-Members $225.00

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