-
by Gordon Ellis -
Topics:
The U.S. National Academy of Engineering (NAE) has announced the election of 87 new members and 18 foreign members to its 2020 class. This year, the following AIChE members join the NAE’s distinguished ranks:
Stacey F. Bent
Professor, Dept. of Chemical Engineering, Stanford Univ. — For contributions to materials surface chemistry and its application across technology platforms from energy to electronics.
Rajeev Gautam
President and Chief Executive Officer, Performance Materials and Technologies, Honeywell — For business and technical leadership in the oil, gas, and petrochemicals industry.
Kenneth E. Goodson
Davies Family Provostial Professor and Senior Associate Dean, Dept. of Mechanical Engineering, Stanford Univ. — For developments in microprocessor thermal management and nanoscale heat conduction.
Ioannis G. Kevrekidis
Bloomberg Distinguished Professor, Dept. of Chemical and Biomolecular Engineering, Johns Hopkins Univ. — For research on multiscale mathematical modeling and scientific computation for complex, nonlinear reaction, and transport processes.
Julia A. Kornfield
Professor, Chemical Engineering, California Institute of Technology — For developing megasupramolecules for antimisting fuel additives and light-adjustable intraocular lenses to improve cataract surgery outcomes.
Anne K. Roby
Executive Vice President, Linde PLC — For developments in oxidation processes, and for leadership in technological developments, safety, and business growth in global industrial gas companies.
Michael V. Sefton
University Professor and Michael E. Charles Professor of Chemical Engineering, Univ. of Toronto — For advances in biomaterials and tissue engineering through cell microencapsulation, and for leadership of large-scale research initiatives.