(315a) Multiscale CFD Model Parallelization with Application to PECVD of Thin Films
AIChE Annual Meeting
Tuesday, October 30, 2018 - 12:30pm to 12:49pm
Motivated by the above considerations, an improved parallel computation strategy is applied which allows for the discretization of both the macroscopic CFD volume and the microscopic kMC algorithm across 64 cores of UCLAâs Hoffman2 computational cluster. The outlined multiscale model is applied to the deposition of 300 nm thick a-Si:H films in two distinct PECVD reactor geometries. The results suggest a significant improvement to the uniformity of the thin-film product (~4% change in the film thickness uniformity) and the reduction in computational costs suggest future implementation of run-to-run control strategies similar to those demonstrated by Crose et al.  for two-dimensional systems.
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