(348a) Tuning and Functionalization of Particle Lithographic Nanopatterns | AIChE

(348a) Tuning and Functionalization of Particle Lithographic Nanopatterns


Wang, S. - Presenter, Wayne State University
Mao, G. - Presenter, Wayne State University
Sobczynski, D. - Presenter, Wayne State University

We developed a chemical vapor deposition method to make nanopatterns based on colloidal particle lithography. Particle lithography is a convenient method to make array structures using 2-D colloidal crystal structure as templates. Polystyrene particles of size 30, 300, and 900 nm were used to make lithographic masks on silicon wafer substrates. Organosilanes including octadecyltrichlorosilane (OTS) and aminopropyltrimethoxysilane (APTMS) were used to make nanopatterns by reacting in the colloidal interstitial space. We found that the organosilane nanopattern formation is very sensitive to the amount of water trapped in the interstitial space. We were able to vary the nanopattern structure from 2-D arrays of nano-holes, to nano-rings, and to nano-dots. The structural variation was accomplished by controlling the amount of interstitial water during chemical vapor deposition. Effective chemical vapor deposition parameters include pressure, temperature, and reaction time. The organosilane nanopatterns were further functionalized with monolayer-protected gold nanoparticles. The organosilane nanopatterns have potential applications in sensors, high-throughput screening, and nano-electronic devices. They can also be used as nano-vessels for studies of nanoconfinement phenomena.