Ramakrishnan Vaidyanathan Citation name: Vaidyanathan, R. Affiliation: University of Illinois, Urbana - Champaign State: IL Country: USA Authored:(45f) Controlling Ultrashallow Junction Formation through Surface ChemistryRamakrishnan VaidyanathanCharlotte Kwok2006 Annual Meeting (613e) Defect Engineering by Short-Annealing-Time Methods for Ultrashallow Junction FormationCharlotte KwokRamakrishnan Vaidyanathan2006 Annual Meeting (446a) Defect Engineering For Ultrashallow Junctions Using SurfacesCharlotte KwokRamakrishnan VaidyanathanS.H. YeongM. P. SrinivasanB. ColombeauL. Chan2007 Annual Meeting (185a) Modeling And Engineering Of Defects In TiO2 For CatalysisAlice G. HollisterRamakrishnan Vaidyanathan2007 Annual Meeting (323a) Photostimulation Of Diffusion And Activation Of Dopants In Ion Implantation ApplicationsPrashun GoraiRamakrishnan VaidyanathanCharlotte Kwok2007 Annual Meeting Asymptotic Behavior of Reaction-Diffusion Pdes in Dopant DiffusionKejia ChenRamakrishnan Vaidyanathan2007 Annual Meeting (135a) Control of Defect Concentrations in Silicon through Surface ChemistryRamakrishnan VaidyanathanKapil Dev2005 Annual Meeting Associated proceedings: 2006 Annual Meeting 2007 Annual Meeting 2005 Annual Meeting
