(22c) Chronic Pain Resulting From Your Relief Device Management Systems | AIChE

(22c) Chronic Pain Resulting From Your Relief Device Management Systems


Moore, D. A. - Presenter, AcuTech Group, Inc.
Arseneau, C. A. - Presenter, Hexion Specialty Chemicals

With the increasing use of Layer of Protection Analysis as a semi-quantitative method of assessing process risk, LOPA practitioners are asked to assign credit to numerous safeguards including relief devices. Relief devices are only as strong as the initial design of the component and the systems that manage subsequent operation and maintenance of the devices. If the management systems for Process Safety Information, Management of Change, PSSR, Incident Investigation, Operating Procedures, Mechanical Integrity, and Training, are not robust enough to ensure diligent management of relief devices, then credit may be applied liberally during a LOPA study resulting in a residual risk lower than the actual risk. This paper analyzes the effects that various PSM management systems have on relief devices, incorporates examples from LOPA studies that reinforce how relief device credits can be liberally applied, and suggests questions that LOPA practitioners can ask about management systems to apply appropriate credits.


This paper has an Extended Abstract file available; you must purchase the conference proceedings to access it.


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