(29a) Technology and Emerging Applications Using Low Temperature Plasmas
AIChE Spring Meeting and Global Congress on Process Safety
2008
2008 Spring Meeting & 4th Global Congress on Process Safety
AIChE / ACS Jointly Co-sponsored Sessions
Industrial Applications of Microwave and Radio Frequency Processing I
Monday, April 7, 2008 - 8:00am to 8:40am
Plasmas have broad applications in materials processing, such as etching, deposition and sterilization. An overview of various methods of producing low temperature plasmas will be presented, and will include a review of the physics and chemistry of radio frequency (RF) and microwave (MW) generated discharges. Included in the review will be a discussion of the electrical and chemical characteristics of atmospheric and low-pressure plasma, plasma stability and uniformity. Emerging applications for these technologies will also be reviewed, and compared with conventional processing techniques.
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