(181at) High-Performance in-Situ Sequential Interpenetrating Network of Bismaleimide and Cyanate Ester for Vat Photopolymerization | AIChE

(181at) High-Performance in-Situ Sequential Interpenetrating Network of Bismaleimide and Cyanate Ester for Vat Photopolymerization

Authors 

Huynh, A. - Presenter, Drexel University
Alvarez, N. J., Drexel University
Palmese, G., Drexel University
Thermosets used in vat photo-polymerization processes typically possess low thermal and mechanical properties relative to traditionally processed systems, and are not suitable for applications in which high temperature performance is needed. We have developed a photocurable resin based on bismaleimide and cyanate ester chemistries that provides outstanding thermal and mechanical characteristics. In this system, an in-situ sequential interpenetrating network (IPN) is formed wherein bismaleimide and a reactive diluent copolymerize during printing resulting in a cyanate ester swollen network with a sub room temperature Tg. During a second step, the cyanate ester is thermally cured. The resulting IPN has a glass transition temperature above 250oC. Additionally, the IPNs show a 50% reduction in shrinkage, improved interlayer strength, and improved toughness relative to standard systems.