(174bi) Atomic Layer Deposition-Enabled Conversion of Porous Polyethersulphone to Laser-Induced Graphene for Charged Membrane Applications
AIChE Annual Meeting
2019
2019 AIChE Annual Meeting
Poster Sessions
General Poster Session I
Monday, November 11, 2019 - 3:30pm to 5:00pm
In this work, we explore the use of laser-induced graphene (LIG) for the creation of conductive ultrafiltration membranes. Porous polyethersulfone (PES) membranes are first coated in a thin layer of alumina using atomic layer deposition (ALD) before being irradiated with an infrared laser. We show that this alumina film, which can be scalably produced using spacial ALD, can localize LIG formation to the surface of the membrane, preventing the buried, un-lased areas of PES from melting and losing their porosity during the lasing process. This allows the top-most layer of the PES to be a conductive coating that can be used to charge the membrane surface and used to improve membrane performance (e.g. through fouling mitigation). The formation of LIG is verified by scanning electron microscopy and Raman spectroscopy. The conductive layer is also shown to possesses relatively high conductivity, which is important for reducing power consumption in devices. Insight into the mechanism behind the improved stability to melting provided by ALD is provided by thermogravimetric analysis, differential scanning calorimetry, and Fourier-transform infrared spectroscopy. The effect of ALD film thickness and the use of sequential infiltration synthesis will also be explored. These insights are used to discuss the potential application of this approach to creating conductive coatings on other polymers using ALD-based approaches.