(538f) Revealing Governing Mechanism in Directed Self-Assembly of Sub 10 Nm Particles into Textured Substrates

There has been a great deal of interest in nanomanufacturing using directed self-assembly of nanoparticles into ordered arrays. Such arrays have potential applications in various emerging fields such as nanobiotechnology, nanoelectronics, nanosensors, and the like. In all these applications, conventional pattering techniques have already reached their limits in resolution. However, strategically placing sub 10 nm particles as active agents on textured substrates could potentially make devices with enhanced functionalities. Using dissipative particle dynamics simulations, we reveal the governing mechanism leading to the directed self-assembly of sub 10 nm particles into templated substrates. Our simulation results illustrate the dynamics of nanoparticles and the flow field at the contact line, suggesting contact line pinning and bending, confinement before directed self-assembly, and flow field redirections at sub 10 nm length scale are the key factors. Utilizing our computational model, we are able to predict positioning of sub 10 nm particles with arbitrary shapes into desired templates and surface textures. Our method, simulation results, and computational tool will offer an innovative approach and fundamental understanding of the dynamics of directed self-assembly of sub 10 nm particles with single particle positioning.