Plasma and Electrochemical Deposition Techniques
AIChE Annual Meeting
2016
2016 AIChE Annual Meeting
Materials Engineering and Sciences Division
Oral
Golden Gate 5
Hilton San Francisco Union Square
Sunday, November 13, 2016 - 3:30pm to 6:00pm
Chair(s)
Thimsen, E., Washington University in Saint Louis
Co-chair(s)
Mededovic, S., Clarkson University
This session will examine recent advances in the fundamental study and application of plasma processes, gas phase and electrochemical deposition techniques, including physical vapor deposition (PVD), chemical vapor deposition (CVD), atomic layer deposition (ALD), and molecular beam epitaxy (MBE), electrochemical deposition and related approaches. Both experimental and theoretical contributions to this session are encouraged.
Presentations
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Pricing
Individuals
| AIChE Pro Members | $150.00 |
| AIChE Graduate Student Members | Free |
| AIChE Undergraduate Student Members | Free |
| AIChE Explorer Members | $225.00 |
| Non-Members | $225.00 |