Plasma Science and Gas Phase Deposition Techniques
AIChE Annual Meeting
Marriott Marquis Atlanta
Sunday, November 16, 2014 - 3:30pm to 6:00pm
This session will examine recent advances in the fundamental study and application of plasma processes and gas phase deposition techniques, including physical vapor deposition (PVD), chemical vapor deposition (CVD), atomic layer deposition (ALD), and molecular beam epitaxy (MBE), and related approaches. Both experimental and theoretical contributions to this session are encouraged.
Paper abstracts are public but to access Extended Abstracts, you must first purchase the conference proceedings.
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