Plasma Science and Gas Phase Deposition Techniques

Chair(s):
Mededovic, S., Clarkson University
Co-chair(s):
Gupta, M., University of Southern California

This session will examine recent advances in the fundamental study and application of plasma processes and gas phase deposition techniques, including physical vapor deposition (PVD), chemical vapor deposition (CVD), atomic layer deposition (ALD), and molecular beam epitaxy (MBE), and related approaches. Both experimental and theoretical contributions to this session are encouraged.

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Individuals

AIChE Members $150.00
AIChE Graduate Student Members Free
AIChE Undergraduate Student Members Free
Non-Members $225.00