(396k) On the Formation of Si-CHA Zeolite Layers and Their Secondary Growth for Continuous CHA Films

Despite its high potential for CO₂/N₂ separations in the post-combustion process, an all-silica CHA (Si-CHA) zeolite membrane has not been reported yet. In particular, the wide size distribution of conventionally synthesized near cubic CHA zeolite particles blocks the formation of a uniform Si-CHA layer.^[1-3] In fact, the mono-dispersity of used zeolite particles is highly required to obtain the uniform layer.^[4,5] Considering the fact that the uniform layer is critical in manufacturing desired zeolite films in the secondary growth method,^[6] the formation of the uniform Si-CHA layer is an important task.

 In this poster presentation, we will discuss how to achieve a uniform Si-CHA layer based on thin plate-like Si-CHA particles, though they exist in minor fraction in the mixture with the above-mentioned conventional near cubic CHA particles. In addition, we will demonstrate the formation of continuous CHA films via the secondary growth of the above-mentioned CHA layer and present the corresponding CO₂/N₂ separation performance. Specifically, we will show the CO₂/N₂ separation performance of the CHA film in the presence and absence of H₂O, which is third major component in the flue gas stream.

References

 [1] Eilertsen, E. A.; Arstad, B.; Svelle, S.; Lillerud, K. P. Micropor. Mesopor. Mater. 2012, 153, 94.

 [2] Olson, D. H.; Camblor, M. A.; Villaescusa, L. A.; Kuehl, G. H. Microporous Mesoporous Mater. 2004, 67, 27.

 [3] Trzpit, M.; Rigolet, S.; Paillaud, J. L.; Marichal, C.; Soulard, M.; Patarin, J. Journal of Physical Chemistry B 2008, 112, 7257.

 [4] Choi, J.; Ghosh, S.; Lai, Z. P.; Tsapatsis, M. Angew. Chem., Int. Ed. 2006, 45, 1154.

 [5] Snyder, M. A.; Tsapatsis, M. Angew. Chem., Int. Ed. 2007, 46, 7560.

 [6] Lai, Z.; Bonilla, G.; Diaz, I.; Nery, J. G.; Sujaoti, K.; Amat, M. A.; Kokkoli, E.; Terasaki, O.; Thompson, R. W.; Tsapatsis, M.; Vlachos, D. G. Science 2003, 300, 456.