(558c) Mechanophotopatterning of a Covalent Adaptable Network | AIChE

(558c) Mechanophotopatterning of a Covalent Adaptable Network


Scott, T. F. - Presenter, University of Michigan
Park, H. Y. - Presenter, University of Colorado at Boulder
Bowman, C. N. - Presenter, University of Colorado at Boulder

The fabrication of well-defined topographical features or textures is a dynamic area of research owing to their extraordinary potential in applications ranging from complex optics to tunable and responsive surfaces.  Here, mechanophotopatterning (MPP) on a covalent adaptable elastomeric network is introduced and enables for the first time the ability to precisely and simultaneously manipulate both material shape and surface topography by exposure to light without the need for solvents, molding, or physical contact.  MPP is a unique patterning approach whereby deformation is applied to an elastomeric material capable of photoinduced structural modification to alter its equilibrium geometry, elegantly complementing previous mechanically assisted patterning techniques.  This material responds to MPP by continuously and locally deforming via polymer network connectivity rearrangement, which enables 3D control of its geometry.  Unlike conventional photolithographic approaches, MPP forgoes any wet chemistry or surface deposition/modification processing and simplifies multi-tiered feature fabrication.  Furthermore, in contrast with mechanically assisted patterning techniques that utilize buckling phenomena, MPP on a photoresponsive elastomer allows an arbitrary-sized and designed feature to be written into the material multiple times, while also being able to change the overall shape of the material.