(374c) Atomic Layer Deposition As a Catalyst Synthesis Technique for Nickel Nanoparticles | AIChE

(374c) Atomic Layer Deposition As a Catalyst Synthesis Technique for Nickel Nanoparticles

Authors 

Gould, T. D. - Presenter, University of Colorado at Boulder
Falconer, J. L. - Presenter, University of Colorado at Boulder
Weimer, A. W. - Presenter, University of Colorado at Boulder


Efforts to design new catalysts for renewable energy applications have revolved around increasing selectivity & activity by exploring advantages of catalysis at the nanoscale, mainly due to geometric & electronic effects.  This work investigates the synthesis of Ni nanoparticle catalysts through the scalable gas phase synthesis route of Atomic Layer Deposition (ALD).  Typically ALD deposits Ni as a NiO film, however; Ni nanoparticles were synthesized by using elevated reaction temperatures to produce particles with diameters <5nm.  Smaller particles were created to have more catalytically active defects on the surface of the particles.  The catalysts were characterized via Temperature Programed Reduction (TPR), chemisorption, Transmission Electron Microscopy (TEM), & Inductively Coupled Plasmon Mass Spectroscopy (ICP-MS) & compared to traditional incipient wetness Ni catalysts.  The incipient wetness Ni catalysts were also used as a base comparison of catalytic activity for alkene hydrogenolysis reactions.  We will also present the investigations of the controlled preparation of bimetallic catalysts using ALD.