Plasma-Assisted and Thermal Chemical Vapor Deposition
- Conference: AIChE Annual Meeting
- Year: 2008
- Proceeding: 2008 Annual Meeting
- Group:
- Type: Oral
- Room: Room 202-B
- Location: Pennsylvania Convention Center
- Time: Tuesday, November 18, 2008 - 3:15pm-5:45pm
Chair(s):
Han, S. M., University of New Mexico
Co-chair(s):
Ekerdt, J. G., University of Texas at Austin
Deposition of thin films using thermal decomposition of metal-organic and organometallic precursors. Characterization of films deposited from CVD.
Papers:
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| AIChE Undergraduate Student Members | Free |
| Non-Members | $225.00 |