Plasma-Assisted and Thermal Chemical Vapor Deposition
Deposition of thin films using thermal decomposition of metal-organic and organometallic precursors. Characterization of films deposited from CVD.
Paper abstracts are public but to access Extended Abstracts, you must first purchase the conference proceedings.
Do you already own this?
Log In for instructions on accessing this content.
|AIChE Graduate Student Members||Free|
|AIChE Undergraduate Student Members||Free|