Plasma Processing I - Co-Sponsored by the American Vacuum Society | AIChE

Plasma Processing I - Co-Sponsored by the American Vacuum Society


Donnelly, V. M., University of Houston


Han, S. M., University of New Mexico

Papers are solicited on the subject of low-temperature plasmas widely used in fabrication of integrated circuits, micro/nanoelectromechanical systems, and optoelectronic devices. This session will feature both modeling and experimental papers. Paper submission is encouraged in the areas of, but not limited to, plasma physics, gas phase and surface chemistry, kinetics and transport phenomena, plasma-surface interactions, diagnostics, process control, and other emerging areas of plasma science and engineering (e.g., flexible substrate electronics and photovoltaics, plasma treatment of biocompatible surfaces, environmentally benign plasma processing, and microdischarges).



Paper abstracts are public but to access Extended Abstracts, you must first purchase the conference proceedings.


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