Interfacial Phenomena in Conducting and Semiconducting Systems

Chair(s):
Sundaram, S., Rohm & Haas Company
Co-chair(s):
Truskett, V. N., Molecular Imprints, Inc.

The session welcomes both experimental and theoretical work concerning all aspects of electronic manufacturing where interfacial phenomena play an enabling role. The general areas of interest (but not limited) are cleaning, chemical mechanical polishing (CMP), metrology, lithography, surface modification, chemical vapor deposition (CVD). Both fundamental and applied works are highly encouraged.

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Individuals

AIChE Members $150.00
AIChE Graduate Student Members Free
AIChE Undergraduate Student Members Free
Non-Members $225.00