Atomic Layer Deposition
- Conference: AIChE Annual Meeting
- Year: 2006
- Proceeding: 2006 Annual Meeting
- Group:
- Type: Oral
- Room: Powell
- Location: Hilton San Francisco
- Time: Friday, November 17, 2006 - 3:15pm-5:45pm
Co-chair(s):
Agarwal, S., Colorado School of Mines
Atomic Layer Deposition is a film growth technology that is capable of depositing uniform and conformal films with atomic precision. It is rapidly growing field with applications in many fields related to chemical engineering. This session will include talks from both electronic materials processing as well as other areas of application. Topics including kinetic analyses, modeling, surface adsorption studies, process integration, and equipment development issues are strongly encouraged.
Papers:
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Pricing
Individuals
| AIChE Members | $150.00 |
| AIChE Graduate Student Members | Free |
| AIChE Undergraduate Student Members | Free |
| Non-Members | $225.00 |