Atomic Layer Deposition | AIChE

Atomic Layer Deposition


Agarwal, S., Colorado School of Mines

Atomic Layer Deposition is a film growth technology that is capable of depositing uniform and conformal films with atomic precision. It is rapidly growing field with applications in many fields related to chemical engineering. This session will include talks from both electronic materials processing as well as other areas of application. Topics including kinetic analyses, modeling, surface adsorption studies, process integration, and equipment development issues are strongly encouraged.



Paper abstracts are public but to access Extended Abstracts, you must first purchase the conference proceedings.


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