(685d) Modified Titania Films for Photoelectrochemical Applications
AIChE Annual Meeting
2006 Annual Meeting
Materials Engineering and Sciences Division
Atomic Layer Deposition
Friday, November 17, 2006 - 4:15pm to 4:35pm
Use of titanium dioxide for photoelectrochemical solar energy applications requires improving its visible range light absorption. ALD is used to produce Zr and nitrogen doped TiO2 films with controlled thickness and composition. The deposited films show improved visible light absorbance and photoelectrochemical activity under visible light. The film chemical composition, morphology, crystal structure and optical properties are reported.
This research supported by the Institute for Advanced Materials, DOE grant #DE-FG02-05ER64071
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