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Chemical Process Maintenance and Risk Reduction

Chair(s):
Dinh, H., Honeywell UOP
Co-chair(s):
Zeng, L., Honeywell UOP

This session seeks papers describing applications and recent advancement in chemical process maintenance and risk reduction. This includes management controls of highly hazardous chemicals and process, consequence analysis and quantitative risk assessment. Papers describing best practices, case studies and lessons learned, and methods and tools for risk assessment are welcome.

Papers:
Topics: 

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Paper abstracts are public but to access Extended Abstracts, you must first purchase the conference proceedings.

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Individuals

AIChE Members $150.00
Employees of CCPS Member Companies $150.00
AIChE Graduate Student Members Free
AIChE Undergraduate Student Members Free
Non-Members $225.00